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PRECINOV

PRECINOV

In progress

Project type

FUI 10

Project holder

Air Liquide Electronics Systems

Partners

KOBUS, CEA Grenoble, CNRS ALPES, GRENOBLE INP - Institut polytechnique de Grenoble, STMicroelectronics Grenoble, Leti

Non-members Partners

LMGP - Laboratoire des matériaux et du génie physique

Challenges

Today's engineers must use a growing number of increasingly complex materials to meet the demanding chemical vapor deposition (CVD) specifications characteristic of the photovoltaics, LED, and semiconductor (CMOS and memory) industries. However, any further progress in this field is limited by the lack of new chemicals, or precursors, available on the market. And even if engineers are able to find the right precursor, they must then learn how to use it effectively. Another major challenge is designing efficient deposition equipment. That requires close collaboration among the engineers working on the chambers, chemical deposition systems, and even end components. The Precinov project--carried out by a consortium of international semiconductor-industry stakeholders operating in the Grenoble area--will strive to overcome those technological challenges.

Objectives

The project will focus on advanced processes for several high-tech industries. For the semiconductor industry, researchers will develop High-k metal gate (HKMG) materials for superior-performance CMOS and new types of high-capacity memory. For the photovoltaics industry, they will come up with new types of transparent conductive oxide layers. And for the LED industry, they will design high-brilliance LEDs using GaN. The main goals of this three- to four-year project are to develop a new deposition method and the associated chamber, introduce new chemicals onto the market, and specify processes for using them through to the chamber step.

Projet infos page d'un projet

Markets

Basic Technologies

Budget

6,460 K€

Duration

36 month

Human resources allocated

40 men/year