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HIBRIX I & II

HIBRIX I & II

High BRIllance X ray source

Completed

Project type

FUI 3

Project holder

Xenocs

Partners

Pfeiffer Vacuum, INPG Entreprise SA, Soitec, Leti

Non-members Partners

NXP

Challenges

For now, there is only one metrology method that can handle semiconductor production rates of over 100 wafers per hour: optical metrology. Metrology systems have struggled to keep up with the miniaturization of semiconductors to the 65 nm technology node and beyond. X-ray metrology is widely seen as the most likely successor of optical metrology for nodes smaller than 65 nm. But existing X-ray systems are not yet powerful enough for online metrology at those nodes.

Objectives

Xenocs--working in association with Alcatel, CEA-Leti, Grenoble Institute of Technology, Nova, Philips, and Soitec--is developing a breakthrough system to generate high-brilliance X-ray beams for semiconductor metrology applications. The system will be designed to deliver excellent performance while remaining compact, stable, and reliable. It will be capable of projecting onto micrometer-sized samples a monochromatic beam up to 15 times brighter than those generated by existing systems. The system will house the process for creating the beam as well as a high-yield optical device to collect and precisely focus the beam. The project team will design the system to meet the demanding metrology needs of the semiconductor industry.

Projet infos page d'un projet

Budget

4,583 K€

Duration

36 month

Human resources allocated

32.7 men/year